| 000 | 01347cam a22003014a 4500 | ||
|---|---|---|---|
| 999 |
_c164689 _d164689 |
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| 020 | _a0521785006 (pbk.) | ||
| 040 | _cCUS | ||
| 082 | 0 | 0 |
_a530.4275 _bVEN/I |
| 100 | 1 | _aVenables, John, | |
| 245 | 1 | 0 |
_aIntroduction to surface and thin film processes/ _cJohn A. Venables. |
| 260 |
_aCambrige, UK ; _aNew York : _bCambridge University Press, _c2000. |
||
| 300 |
_axvi, 372 p. : _bill. ; _c26 cm. |
||
| 504 | _aIncludes bibliographical references (p. 331-361) and index. | ||
| 505 | _a1. Introduction to surface processes 2. Surfaces in vacuum: ultra-high vacuum techniques and processes 3. Electron-based techniques for examining surface and thin film processes 4. Surface processes in adsorption 5. Surface processes in epitaxial growth 6. Electronic structure and emission processes at metallic surfaces 7. Semiconductor surfaces and interfaces 8. Surface processes in thin film devices 9. Postscript: where do we go from here? | ||
| 650 | 0 | _aThin films. | |
| 650 | 0 | _aSurface chemistry. | |
| 942 | _cSC79 | ||